Metrological atomic force microscope and traceable measurement of nano-dimension structures

Authors

  • Sitian Gao National Institute of Metrology
  • Mingzhen Lu National Institute of Metrology
  • Wei Li National Institute of Metrology
  • Yushu Shi National Institute of Metrology
  • Qi Li National Institute of Metrology

DOI:

https://doi.org/10.21014/acta_imeko.v2i1.41

Abstract

The quantity assurance in semiconductor industry development requires dimensional measurement with nanometer accuracy. A metrological AFM is designed to establish a traceable standard with nanometer uncertainty. The principle and design of the instrument is introduced in this paper. The displacement of the sample is traced to the SI unit by interferometers. The metrological AFM is applied to step height and line width measurement. The results are compared with optical instrument and profilometer. The metrological AFM is used to step height measurement in an international comparison and the result shows an uncertainty less than 2 nm. The application of metrological AFM in line width and pitch are also introduced.

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Published

2013-08-16

Issue

Section

Research Papers